By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist AR-P 3500 (T) Series is a high-resolution positive photoresist designed for advanced semiconductor, MEMS, and micro-/nanofabrication applications. Engineered for precision, reproducibility, and robust process performance, it is suitable for both research environments and industrial-scale lithography.
Characterisation
- broadband UV, i-line, g-line
- high photosensitivity, high resolution
- very good adhesion properties
- 3500 T: robust processing, suitable for TMAH developer 0.26 n
- plasma etching resistant, temperature-stable up to 120 °C
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA
AR-P 3510 Properties:
- Solids content: 35%
- Viscosity 25 °C: 33 mPas
- Film thickness/4.000 rpm: 2.0 µm
- Resolution: 0.8 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
AR-P 3510 T Properties:
- Solids content: 32%
- Viscosity 25 °C: 38 mPas
- Film thickness/4.000 rpm: 2.0 µm
- Resolution: 0.6 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
AR-P 3540 Properties:
- Solids content: 31%
- Viscosity 25 °C: 18 mPas
- Film thickness/4.000 rpm: 1.4 µm
- Resolution: 0.7 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
AR-P 3540 T Properties:
- Solids content: 28%
- Viscosity 25 °C: 21 mPas
- Film thickness/4.000 rpm: 1.4 µm
- Resolution: 0.5 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
Available to order in pack sizes:
- 100 ml
- 250 ml
- 1L
Pricing available on request.
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