Chemicals & Photoresists, thinner
AR 600 Series thinners
For adjusting the film thickness of photoresists and e-beam resists
INFOS3 offers a comprehensive portfolio of Chemicals & Photoresists, including dicing fluids, solvents, and related materials.
For adjusting the film thickness of photoresists and e-beam resists
INFO
For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1
INFO
KOH and HF resistant protective coating for wafer backside protection
INFO
Conductive protective coating for e-beam resists Top layer for the dissipation of e-beam charges on insulating...
INFO
Wafer backside protection during front side etchings for the production of deep structures in silicon
INFO
(Experimental sample/custom-made product) Positive photoresist for high-temperature application up to 300 °C
INFO
Sensitive resists for the production of vapour deposition patterns by lift-off
INFO
Sensitive positive-tone standard resists for the production of integrated circuits
INFO
Thick positive resists for electroplating and microsystems technology
INFO
Adhesion-enhanced positive resists for the production of masks and fine scale divisions
INFO
Ready-to-use positive spray resists for various applications
INFO
AR-P 8100 Series (Phoenix 81) positive photoresists deliver high-resolution patterning for semiconductor, MEMS, and microfabrication applications.
INFOHigh-purity hydrogen peroxide for semiconductor cleaning, oxidation and advanced wet process applications.
INFOHigh-purity acids & bases for semiconductor cleaning, etching and surface preparation in demanding wet processes.
INFO
Thick positive resists for the production of microcomponents.
INFO