by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 642 Series
High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.
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Chemicals & Photoresists
S3 offers a comprehensive portfolio of Chemicals & Photoresists, including dicing fluids, solvents, and related materials.
by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 641 Series
High-resolution positive photoresist for precise semiconductor, MEMS, and micro/nanofabrication applications.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 639 Series
High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 632 Series
Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 617 Series
Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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by ALLRESIST GmbH
by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4600 Series (Atlas 46)
Extreme stable resist structures, thick thickness, adequate SU-8
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4400 Series (CAR 44)
Thick and very thick negative resists for electroplating, microsystem technology and LIGA < 20 μm –...
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4340 (CAR)
Highly sensitive negative resist for the production of integrated circuits
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 2200 Series
Ready-to-use negative spray resists for various applications
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by ALLRESIST GmbH
Chemicals & Photoresists
SX AR-N 8400 Series (Medusa 84 SiH)
High-performance negative photoresist for advanced semiconductor and MEMS lithography.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 7520 Series
High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 7520 New Series
High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance
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by ALLRESIST GmbH
Chemicals & Photoresists
X AR 600-50/2
High-purity and ultra-fine filtered developer for selective T-gate applications
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by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-40 Series
For the development of photoresists and novolac-based e-beam resist films
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by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-26 and AR 300-35
For the development of photoresists and novolac-based e-beam resist films
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5480
Positive or negative system for optically transparent and thermally resistant structures
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5460
Positive or negative system for optically transparent and thermally resistant structures
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by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
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