By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
Allresist AR 600-60 is a high-performance stopper specifically formulated for use with the AR 600 series of photoresists. Designed to provide precise control over resist development, it ensures reliable protection of selected areas during photolithography processes. AR 600-60 offers excellent adhesion, chemical stability, and uniform coverage, making it ideal for advanced microfabrication and semiconductor applications.
Characterisation
- immediate interruption of the development process
- ultrapure solvent mixtures for residue-free removal of remaining developer
- If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.
AR 600-60 Properties:
- Density at 20 °C: 0.785 g/cm3
- Water content max.: 0.1 %
- Non-volatiles max.: 0.002 %
- Flash point: 12 °C
- Filtration: 0.2 µm
- Storage up to 6 month: 10-22 °C
Available to order in pack sizes:
- 1L
Pricing available on request.
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Information on remover processing:
The addition of stopper for approximately 30 s after development interrupts the development process and leads to a rapid rinsing of residual developer.
Due the processing regime however, constantly developer is transferred into the stopper bath. Already small amounts of the developer will affect the efficiency of the stopping process. It is thus highly recommended to constantly exchange the stopper or to use two stopper baths which are arranged consecutively.
If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.
If the stopper AR 600-60 is used for developers AR-P 630-670, higher contrast values up to 10 are possible, while the sensitivity of the PMMA resists is at the same time decreased. Higher exposure doses and prolonged development times are thus required in this case.