By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists, thinner
Product Description:
Allresist AR 600-02, AR 600-07 and AR 600-09 are high-purity thinners developed for precise viscosity adjustment of Allresist AR 600 series photoresists. These thinners enable fine control over resist flow and film thickness, supporting uniform coatings and high-quality surface morphology in advanced photolithography processes.
Characterisation
- ultra-filtered, colourless, high-purity organic solvent mixtures
- adjustment of resist film thickness by defined dilution: AR 600-02, 600-07 and 600-09 for e-beam resists
- edge bead removal of coated substrates as well as cleaning of equipment
AR 600-02 Properties:
- Main component(s): anisole
- Density at 20 °C: 0.990 g/cm3
- Refractive index at 20 °C: 1.517
- Water content max.: 0.1 %
- Flash Point: 44 °C
- Storage 6 month: 10-22 °C
AR 600-07 Properties:
- Main component(s): methoxypropanol
- Density at 20 °C: 0.960 g/cm3
- Refractive index at 20 °C: 1.403
- Water content max.: 0.1 %
- Flash Point: 38 °C
- Storage 6 month: 10-22 °C
AR 600-09 Properties:
- Main component(s): ethyl lactate
- Density at 20 °C: 1.036 g/cm3
- Refractive index at 20 °C: 1.413
- Water content max.: 0.1 %
- Flash Point: 38 °C
- Storage 6 month: 10-22 °C
Available to order in pack sizes:
- 1L
Pricing available on request.
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Application properties:
Dilution is performed as follows:
- placing of defined amount of resist
- addition of defined amount of thinner
- homogenisation by stirring (both liquids should be mixed quickly)
- fine filtration (0.2 µm)