By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists, thinner
Product Description:
Allresist AR 300-12 is a high-purity solvent specifically formulated for adjusting the viscosity of Allresist photoresists. Designed to ensure consistent coating properties, AR 300-12 provides uniform resist films with smooth surface morphology, enabling precise pattern definition in advanced photolithography processes.
Characterisation
- ultra-filtered, colourless, high-purity organic solvent mixtures
- adjustment of resist film thickness by defined dilution
- edge bead removal of coated substrates as well as cleaning of equipment
- removal of photoresist films tempered at up to 150 °C and of non-tempered e-beam resist films
AR 300-12 Properties:
- Main component(s): PGMEA
- Density at 20 °C: 0.970 g/cm3
- Refractive index at 20 °C: 1.402
- Water content max.: 0.1 %
- Flash Point: 42 °C
- Storage 6 month: 10-22 °C
Available to order in pack sizes:
- 2.5L
Pricing available on request.
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Application properties:
Dilution is performed as follows:
- placing of defined amount of resist,
- addition of defined amount of thinner,
- homogenisation by stirring (both liquids should be mixed quickly), and
- fine filtration (0.2 µm).