By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist AR-BR 5460 is a high-performance bottom anti-reflective coating (BARC) designed for use in advanced semiconductor, MEMS, and micro-/nanofabrication lithography processes. It is engineered to minimise substrate reflectivity, thereby improving critical dimension (CD) control, pattern fidelity, and overall process stability during photolithography.
AR-BR 5460 effectively suppresses standing waves and reflective notching caused by substrate reflections, enabling the formation of well-defined, high-resolution photoresist patterns. Its optical properties are carefully tuned to ensure compatibility with commonly used exposure wavelengths, making it suitable for integration into both R&D and production lithography workflows.
Characterisation:
- bottom resist not light sensitivity
- broadband UV, i-line, g-line for top resist
- for lift-off structures
- for optically transparent structures from 270 nm to IR with thermally stable structures up to 250 °C
- aqueous-alkaline development
- temperature-stable up to 140 °C (with AR-P 3500)
- 5400 copolymer methyl methacrylate/methacrylic acid
- 3- safer solvent PM (5400), PGMEA (3500, 4340)
AR-BR 5460 Properties:
Solids content: 12%
Viscosity 25 °C: 73 mPas
Film thickness/4.000 rpm: 1.0 µm
Resolution top resist 2 L: 3.0 µm
Flash Point: 30 °C
Storage 6 month: 10-22 °C
Available to order in pack sizes:
- 100 ml
- 250 ml
- 1L
Pricing available on request.
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