By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist AR-N 4340 (CAR) is a high-resolution negative chemically amplified resist (CAR) designed for advanced semiconductor, MEMS, and micro-/nanofabrication applications. It provides exceptional patterning precision, high sensitivity, and excellent process reproducibility, making it ideal for both research and industrial lithography processes that require submicron and nanoscale feature definition.
Characterisation:
- i-line, g-line
- highest sensitivity, excellent resolution
- good adhesion, high contrast, chemically enhanced
- undercut profiles (lift-off) are possible
- temperature-stable up to 220 °C after subsequent treatment
- novolac with photochemical acid generator and amine-based crosslinking agent
- safer solvent PGMEA
AR-N 7520.073 Properties:
- Solids content: 32%
- Viscosity 25 °C: 18 mPas
- Film thickness/4.000 rpm: 1.4 µm
- Flash point: 42 °C
- Storage 6 month: 10-18 °C
Available to order in pack sizes:
- 100 ml
- 250 ml
- 1L
Pricing available on request.
file_downloadAR-N4300_english_Allresist_product_information.pdf
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