By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist AR-P 3740 is a high-resolution positive photoresist developed for advanced semiconductor, MEMS, and micro-/nanofabrication applications. It is engineered to provide precision, high contrast, and excellent process reproducibility, making it suitable for both research and industrial lithography where consistent results are critical.
Characterisation
- broadband UV, i-line, g-line
- high sensitivity, highest resolution up to 0.4 μm
- high contrast, excellent dimensional accuracy
- optimised coating properties on topologically complex substrate surfaces
- plasma etching resistant, stable up to 120 °C
- combination of novolac and naphthoquinone diazide
- safer solvent PGMEA
AR-P 3740 Properties:
- Solids content: 29%
- Viscosity 25 °C: 22 mPas
- Film thickness/4.000 rpm: 1.4 µm
- Resolution: 0.4 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
Available to order in pack sizes:
- 100 ml
- 250 ml
- 1L
Pricing available on request.
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