By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist AR-PC 5094.02 is a high-performance protective coating designed for semiconductor, MEMS, and micro-/nanofabrication processes. It provides robust chemical and thermal resistance, making it ideal for protecting sensitive structures during aggressive wet etching, cleaning, and multi-step processing.
Characterisation
- as protective coating, this resist is not sensitive to light / radiation
- thin, conductive layers for the dissipation of charges during electron exposure
- for coating on all AR e-beam resists, e.g. CSAR 62, Medusa 84 SiH, except CAR resists
- Improved properties compared to AR-PC 5092.02
- easy removal with water after exposure
- polyaniline-derivative dissolved in water
AR-PC 5094.02 Properties:
- Solids content: 2%
- Viscosity 25 °C: 1 mPas
- Film thickness/4000 rpm: 42 nm
- Film thickness/1000 rpm: 100 nm
- Storage temperature: 8-12 °C
Available to order in pack sizes:
- 30ml
- 100 ml
- 250 ml
- 1L
Pricing available on request
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Processing instructions
The conductivity may be varied by adjusting the thickness with different rotational speeds. Thicker layers of 90 nm thus have a 2.5 times higher conductivity as compared to 60 nm thick layers.
For the build-up of an even conductive layer, the substrate should be wetted with the resist solution before the spin process is started.