By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
The Allresist SX AR-P 3500/8 is a solvent-free, high-resolution positive photoresist developed within Allresist’s SX (Solvent eXtended) platform, combining excellent lithographic performance with improved environmental and workplace safety. It is designed for advanced semiconductor, MEMS, and micro-/nanofabrication applications where precision and process reliability are critical.
Characterisation
- broadband, i-line, g-line
- high plasma resistant, thermally stable up to 300 °C
- suitable for: high-temperature 2-layer lift-off processes as well as plasma etching and implantation processes
- combination of poly(hydroxystyrene-co-MMA)-naphthoquinone diazide
- safer solvent PGMEA
AR-P 3500/8 Properties:
- Solids content: 27%
- Viscosity 25 °C: 20 mPas
- Film thickness/4.000 rpm: 1.4 µm
- Resolution: 0.8 µm
- Flash Point: 42 °C
- Storage 6 month: 10-18 °C
Pricing and pack sizes available on request.
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