By ALLRESIST GmbH
Supplier Info
Product Type:
Parts & Consumables
Application:
Chemicals & Photoresists
Product Description:
Allresist X AR 600-50/2 is a high-performance developer designed for advanced photolithography applications using the AR 600 series of photoresists. Optimized for precision and consistency, it provides reliable resist development with excellent reproducibility, ensuring sharp pattern definition and uniform feature sizes across a wide range of micro- and nano-fabrication processes.
This developer is particularly suitable for semiconductor, MEMS, and microelectronics applications where high-resolution patterning and controlled development rates are critical. Its formulation is engineered for smooth interaction with AR 600-50 resist films, minimizing defects and supporting high-throughput manufacturing environments.
Characterisation:
- ultrapure, ultra-filtered (0.2 μm) solvent mixture
- storage at 10-22 °C for 6 month
X AR 600-50/2 Properties:
- Main component(s): Ethanol
- Refractive index at 20 °C: 1.366
- Flash Point: 12 °C
Available to order in pack sizes: 1L
Pricing available on request.
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