by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-40 Series
For the development of photoresists and novolac-based e-beam resist films
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ALLRESIST GmbH
Allresist GmbH offers a comprehensive range of high-performance photoresists, e-beam resists, and complementary process chemicals for micro- and nanolithography. Their portfolio includes standard formulations as well as customised solutions tailored to specific process requirements. Designed for applications in semiconductor manufacturing, microsystems, and research, Allresist products deliver exceptional resolution, process stability, and reproducibility. Backed by rigorous quality control and continuous innovation, their portfolio ensures reliable performance for advanced patterning technologies worldwide.
by ALLRESIST GmbH
Chemicals & Photoresists, Developer
AR 300-26 and AR 300-35
For the development of photoresists and novolac-based e-beam resist films
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5480
Positive or negative system for optically transparent and thermally resistant structures
INFO
by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5460
Positive or negative system for optically transparent and thermally resistant structures
INFO
by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
INFO