by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 671 Series
High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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ALLRESIST GmbH
Allresist GmbH offers a comprehensive range of high-performance photoresists, e-beam resists, and complementary process chemicals for micro- and nanolithography. Their portfolio includes standard formulations as well as customised solutions tailored to specific process requirements. Designed for applications in semiconductor manufacturing, microsystems, and research, Allresist products deliver exceptional resolution, process stability, and reproducibility. Backed by rigorous quality control and continuous innovation, their portfolio ensures reliable performance for advanced patterning technologies worldwide.
by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 669 Series
High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 662 Series
High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 661 Series
High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication applications.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 649 Series
High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 642 Series
High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 641 Series
High-resolution positive photoresist for precise semiconductor, MEMS, and micro/nanofabrication applications.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 639 Series
High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 632 Series
Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-P 617 Series
Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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by ALLRESIST GmbH
by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4600 Series (Atlas 46)
Extreme stable resist structures, thick thickness, adequate SU-8
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4400 Series (CAR 44)
Thick and very thick negative resists for electroplating, microsystem technology and LIGA < 20 μm –...
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 4340 (CAR)
Highly sensitive negative resist for the production of integrated circuits
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 2200 Series
Ready-to-use negative spray resists for various applications
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by ALLRESIST GmbH
Chemicals & Photoresists
SX AR-N 8400 Series (Medusa 84 SiH)
High-performance negative photoresist for advanced semiconductor and MEMS lithography.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 7520 Series
High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance.
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 7520 New Series
High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance
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by ALLRESIST GmbH
Chemicals & Photoresists
X AR 600-50/2
High-purity and ultra-fine filtered developer for selective T-gate applications
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by ALLRESIST GmbH