by ALLRESIST GmbH
Chemicals & Photoresists
AR-N 7520 New Series
High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance
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Chemicals & Photoresists
S3 offers a comprehensive portfolio of Chemicals & Photoresists, including dicing fluids, solvents, and related materials.
by ALLRESIST GmbH
Chemicals & Photoresists
X AR 600-50/2
High-purity and ultra-fine filtered developer for selective T-gate applications
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by ALLRESIST GmbH
by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-40 Series
For the development of photoresists and novolac-based e-beam resist films
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by ALLRESIST GmbH
Chemicals & Photoresists, Developer
AR 300-26 and AR 300-35
For the development of photoresists and novolac-based e-beam resist films
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5480
Positive or negative system for optically transparent and thermally resistant structures
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by ALLRESIST GmbH
Chemicals & Photoresists
AR-BR 5460
Positive or negative system for optically transparent and thermally resistant structures
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by ALLRESIST GmbH
Chemicals & Photoresists
AR 300-80 new
For improving the adhesive strength of photo and e-beam resists
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by MILLICE
Chemicals & Photoresists, Wafer Handling
TruClean CL-300
A semi-aqueous cleaning solution engineered for advanced wafer surface and tool cleaning.
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by APPLIED QUANTUM MATERIALS INC.
Chemicals & Photoresists
H-SiOx Resist
Negative photo- and electron-beam resist, specifically designed for nanolithography device fabrication.
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by MILLICE
Chemicals & Photoresists, Sägen
KerfAid™ Dicing Fluid
The original dicing fluid is a wafer-safe additive to DI water during the wafer-dicing process.
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by MILLICE
Chemicals & Photoresists
StripAid™ X Solvent
Biodegradable solvent used for debonding temporary adhesive.
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