Chemicals & Photoresists
AR-P 6200 Series (CSAR 62)
High-contrast e-beam resists for the production of integrated circuits and masks
INFOS3 offers a comprehensive portfolio of Chemicals & Photoresists, including dicing fluids, solvents, and related materials.
High-contrast e-beam resists for the production of integrated circuits and masks
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High-performance positive photoresist for precise submicron lithography.
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High-performance positive photoresist for precise submicron lithography.
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High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication applications.
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High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.
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High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.
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High-resolution positive photoresist for precise semiconductor, MEMS, and micro/nanofabrication applications.
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High-performance positive photoresist for submicron semiconductor and MEMS patterning.
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Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.
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Extreme stable resist structures, thick thickness, adequate SU-8
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Thick and very thick negative resists for electroplating, microsystem technology and LIGA < 20 μm –...
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Highly sensitive negative resist for the production of integrated circuits
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Ready-to-use negative spray resists for various applications
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High-performance negative photoresist for advanced semiconductor and MEMS lithography.
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High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance.
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