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by ALLRESIST GmbH
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Chemicals & Photoresists


AR-P 679 Series


High-performance positive photoresist for precise submicron lithography.  

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Chemicals & Photoresists


AR-P 672 Series


High-performance positive photoresist for precise submicron lithography.

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Chemicals & Photoresists


AR-P 671 Series


High-performance positive photoresist for submicron semiconductor and MEMS patterning.

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Chemicals & Photoresists


AR-P 669 Series


High-performance positive photoresist for submicron semiconductor and MEMS patterning.

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Chemicals & Photoresists


AR-P 662 Series


High-performance positive photoresist for submicron semiconductor and MEMS patterning.

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Chemicals & Photoresists


AR-P 661 Series


High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication applications.

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Chemicals & Photoresists


AR-P 649 Series


High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.

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Chemicals & Photoresists


AR-P 642 Series


High-resolution positive photoresist for advanced semiconductor, MEMS, and micro/nanofabrication.

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Chemicals & Photoresists


AR-P 641 Series


High-resolution positive photoresist for precise semiconductor, MEMS, and micro/nanofabrication applications.

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AR-P 630-670 Series

Chemicals & Photoresists


AR-P 639 Series


High-performance positive photoresist for submicron semiconductor and MEMS patterning.

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AR-P 630-670 Series_2

Chemicals & Photoresists


AR-P 632 Series


Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.

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AR-P 617

Chemicals & Photoresists


AR-P 617 Series


Reliable positive photoresist offering excellent resolution and stability for advanced lithography processes.

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Resists+Process-chemicals_all-bottles_web

Chemicals & Photoresists


SX AR-N 4340/7


Negative photoresist for one- and two-layer systems

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AR-N_4400

Chemicals & Photoresists


AR-N 4400 Series (CAR 44)


Thick and very thick negative resists for electroplating, microsystem technology and LIGA < 20 μm –...

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Chemicals & Photoresists


AR-N 4340 (CAR)


Highly sensitive negative resist for the production of integrated circuits

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AR-N_2200

Chemicals & Photoresists


AR-N 2200 Series


Ready-to-use negative spray resists for various applications

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AR-N 7520

Chemicals & Photoresists


AR-N 7520 Series


High-resolution negative photoresist for precise micro- and nanolithography with excellent etch resistance.

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