Chemicals & Photoresists, thinner
AR 600 Series thinners
For adjusting the film thickness of photoresists and e-beam resists
INFOAllresist GmbH offers a comprehensive range of high-performance photoresists, e-beam resists, and complementary process chemicals for micro- and nanolithography. Their portfolio includes standard formulations as well as customised solutions tailored to specific process requirements. Designed for applications in semiconductor manufacturing, microsystems, and research, Allresist products deliver exceptional resolution, process stability, and reproducibility. Backed by rigorous quality control and continuous innovation, their portfolio ensures reliable performance for advanced patterning technologies worldwide.
For adjusting the film thickness of photoresists and e-beam resists
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For stopping the protective coating SX AR-PC 5000/41 after development with X AR 300-74/1
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KOH and HF resistant protective coating for wafer backside protection
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Conductive protective coating for e-beam resists Top layer for the dissipation of e-beam charges on insulating...
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Wafer backside protection during front side etchings for the production of deep structures in silicon
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(Experimental sample/custom-made product) Positive photoresist for high-temperature application up to 300 °C
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Sensitive resists for the production of vapour deposition patterns by lift-off
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Sensitive positive-tone standard resists for the production of integrated circuits
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Thick positive resists for electroplating and microsystems technology
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Adhesion-enhanced positive resists for the production of masks and fine scale divisions
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Ready-to-use positive spray resists for various applications
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AR-P 8100 Series (Phoenix 81) positive photoresists deliver high-resolution patterning for semiconductor, MEMS, and microfabrication applications.
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Thick positive resists for the production of microcomponents.
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High-contrast e-beam resists for the production of integrated circuits and masks
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High-performance positive photoresist for precise submicron lithography.
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High-performance positive photoresist for precise submicron lithography.
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